Photolithography
By DarthVader
Date: 2026-11-13
Topic: 258 see comments
Post views: 7
Photolithography
- Photolithography is the process used to pattern parts on a thin film or substrate.
- It uses light to transfer a geometric pattern from a photomask to a light sensitive organic layer of resist material on the substrate.
- This material was previously deposited as a thin film and is called photoresist.
Photolithography diffraction limit:
The diffraction limit, d, represents the minimum feature size that can be resolved.
d = \(\frac{λ}{2NA}\)
d = (\frac{λ}{2NA}\)
Where:
d = diffraction limit
NA = constant (typically 0.25 < NA < 0.95
Resolution:
R = \(\frac{k_1λ}{NA}\)
R = (\frac{k_1λ}{NA}\)
Depth of focus limit (DOF):
DOF = \(\frac{k^2λ}{(NA)^2}\)
DOF = (\frac{k^2λ}{(NA)^2}\)
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